Complexion Clearing Masque makeup and other impurities

makeup and other impurities

KEY INGREDIENTS Ultrasomes (UV-endonuclease) and roxisomes (glycosylase): Helps support the skin’s natural restoration process

KEY INGREDIENTS High-potency retinol: Improves skin texture + dryness and eliminates visible discoloration for brighter + smoother looking skin

improves the appearance of lines + wrinkles

Do not use if on damaged or broken skin

Complexion Clearing Masque makeup and other impuritiesBENEFITS Absorbs surface oils Helps clear out clogged pores Can be used as a spot treatment on blemishes DIRECTIONS FOR USE Clean the skin thoroughly before applying this product. Cover the entire affected area with a thin layer and rinse thoroughly twice a week. Remove with warm water. If bothersome dryness or peeling occurs, reduce application to once a week. KEY INGREDIENTS Sulfur: Minimizes surface oil Glycerin: Replenishes and restores hydration